Presenter: Carly Wright
Mentor: Ben McMorran
Poster: 36
Major: Physics/Math
Studying electron diffraction using transmission electron microscopy allows us to better understand many different phenomena in physics, particularly conservation of forces and wave-particle duality. To be able to make these observations, we require diffraction gratings on the nanoscale. This can be done with a variety of techniques, but our particular focus is electron beam lithography. EBL is a dynamic method for fabrication and can be used from the micro-scale down to the nanoscale, but for our particular purposes and scale it is somewhat difficult to achieve nicely resolved lines. This technique involves coating a sample with a photosensitive resist that breaks down at the molecular level from the bombardment of electrons and then developing the resist to create physical features. Using this process, we were able to create straight and forked gratings ranging from 100nm pitch to 50nm pitch that can be used to study the behavior of electrons inside of a transmission electron microscope. With some revisions to our technique, we hope to decrease this pitch down to 20nm while maintaining efficiency, which will provide clearer diffraction data.